Structural Changes of UHV Deposited Titanium Thin Films in Presence of Oxygen Flow and Temperature

Abstract

Titanium dioxide thin layers on glass substrates, were produced by annealing method, different annealing temperatures as, 393K, 493K and
593K were used. The initial layers were Ti/glass, with same thicknesses, near normal deposition angle and same deposition rate that produced in
room temperature, an uniform oxygen flow with 6 cm3/sec , were used for oxidation. The nano structure of the layers were determined by AFM and
XRD methods. Roughness of the films changed due to annealing process. topography and crystallography of produced layers also changed during
annealing processes.