Production and Structural Changes of Nickel Nitride Films as a Function of Deposition Angle

Abstract

Nickel Nitride thin films of 90 nm thickness at two different deposition angles of 30 and 40 degrees were deposited on glass substrates at room
temperature, by using resistive evaporation method under UHV conditions. The structural details were determined by AFM and XRD methods.
The optical spectra were measured by spectrophotometer in the spectral range of 300 −1100 nm wave length (UV-VIS). The relation between
nanostructures and optical properties with deposition angle were discussed.